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High-purity gases for solar panel manufacturing | Inox Air Products

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Gases for Solar PV Cell Manufacturing

At INOXAP, we power the photovoltaic revolution. Every high-purity gas we supply is a critical ingredient, engineered to meet the exacting demands of modern solar PV cell manufacturing, enabling superior performance and durability.

Core Process Gases

Silane (SiH₄)

Fundamental silicon source in CVD processes. Forms amorphous and polycrystalline silicon layers in PECVD, enabling high-quality tunnel oxide layers in TOPCon cells.

Ammonia (NH£)

Vital for silicon nitride antireflective coatings. Nitrogen source in PECVD for Si£N¤ coatings, improving surface passivation and light capture.

Nitrous Oxide (N¢O)

Provides oxygen atoms for clean, uniform silicon oxide layers. Forms silicon oxynitride layers for surface passivation, improving optical absorption.

Advanced Doping & Deposition

Trimethyl Aluminum (TMA)

Enables ultra-thin Al¢O£ passivation layers through ALD. Improves rearside efficiency in PERC/TOPCon designs, enhancing dielectric and interface engineering.

Boron Trichloride (BCl£)

Key to precision plasma etching and boron doping for p-type junctions. Removes native oxides and surface impurities, enabling tighter process control.

Phosphine-Hydrogen Mix (PH£ + H¢)

Introduces phosphorus atoms to create n-type conductivity, forming the cell's essential p-n junction. Hydrogen carrier ensures precise concentration control.

Diborane-Hydrogen Mix (B¢H₆ + H¢)

Used for precise p-type doping, introducing boron atoms to create charge-absorbing junctions. Ensures optimal electrical characteristics for power generation.

Support & Cleaning Gases

Ultra-High Purity Oxygen (O₂)

Enables controlled thermal growth of silicon dioxide layers for surface passivation and gate dielectrics. Critical for high-efficiency solar cell junction formation.

Hydrogen (H₂)

Carrier, reducing, and annealing gas crucial in passivating defects in silicon layers. Neutralizes dangling bonds, creating an inert environment for deposition processes.

Nitrogen Trifluoride (NF₃)

Preferred cleaning agent for CVD chambers. Efficiently removes silicon-based residues, ensuring every deposition run starts with a pure surface.

Ultra-High Purity Nitrogen (N₂)

Provides inert, blanketing environment throughout manufacturing, preventing oxidation and contamination during critical high-temperature processes like diffusion and annealing.

Why INOXAP?

The complex symphony of gases for solar cell manufacturing requires a partner with unwavering commitment to safety, quality, and precision. Each INOXAP product is bottled with precision, ensuring your solar panel gas processes achieve peak efficiency, yield, and return on investment.

Precision

High-purity gases engineered for exacting solar manufacturing demands

Efficiency

Optimized processes for peak cell performance and yield

Partnership

Comprehensive support for your solar manufacturing needs

Contact INOXAP: Email Spg@inoxap.com or reach out to your INOX Air Products Sales Coordinator for more information.

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