Report Overview:
Post etch residue cleaners, also known as post etch residue removers, are specialized chemical formulations designed to eliminate organic and inorganic residues from semiconductor wafer surfaces after etching processes. These cleaners play a critical role in semiconductor manufacturing by ensuring clean surfaces for subsequent deposition and patterning steps. The technology encompasses both aqueous and semi-aqueous formulations, with applications spanning dry etching and wet etching processes across memory and logic device fabrication.
The market growth is driven by increasing semiconductor production, particularly in Asia-Pacific where 74% of global demand originates. While the industry faces challenges from material cost fluctuations, advancements in cleaner formulations to address complex etch residues at smaller nodes are creating new opportunities. Recent developments include Entegris' 2023 launch of advanced cleaner solutions for 3nm node manufacturing, reflecting the industry's response to evolving technological requirements.
Market Value:
Global Post Etch Residue Cleaner market size was valued at USD 190 million in 2024. The market is projected to grow from USD 203 million in 2025 to USD 296 million by 2032, exhibiting a CAGR of 6.7% during the forecast period.
By Applications:
Dry Etching
Wet Etching
Dielectric Etching
Metal Etching
By Types:
• Aqueous
• Semi-aqueous
• Solvent-based
• Specialty formulations
Key players include:
• Entegris, Inc. (U.S.)
• DuPont de Nemours, Inc. (U.S.)
• Merck KGaA (Versum Materials) (Germany)
• Mitsubishi Gas Chemical Company, Inc. (Japan)
• Fujifilm Holdings Corporation (Japan)
• BASF SE (Germany)
• Tokyo Ohka Kogyo Co., Ltd. (Japan)
