Report Overview:
Electron beam negative adhesive, used in 3 D exposure process.Chemical amplifying adhesive, high sensitivity, very low contrast (lt;1), is very suitable for making threedimensional structure;It can also be used for fabrication of diffracted optics and holographic devices.
This report provides a deep insight into the global Negative Electron Beam Resists market covering all its essential aspects. This ranges from a macro overview of the market to micro details of the market size, competitive landscape, development trend, niche market, key market drivers and challenges, SWOT analysis, value chain analysis, etc.
Market Value:
Global Negative Electron Beam Resists market size was estimated at USD 57 million in 2024 and is projected to reach USD 90.73 million by 2032, exhibiting a CAGR of 5.30% during the forecast period.
North America Negative Electron Beam Resists market size was estimated at USD 16.23 million in 2024, at a CAGR of 4.54% during the forecast period of 2025 through 2032.
CAGR of 5.30%
(2024 – 2032)
By Applications:
Semiconductors
LCDs
Printed Circuit Boards
By Types:
• High Contrast?> 5?
• Low Contrast?< 5?
Key players include:
• Toray
• Zeon
• Tokyo Ohka Kogyo
• KemLab
• ALLRESIST GmbH
• Fujifilm
• Kayaku Advanced Materials
