Semiconductor EUV Photomask Inspection Equipment
Market size was valued at US$ 1.15 billion in 2024 and is projected to reach US$ 2.28 billion by 2032, at a CAGR of 9.14% during the forecast period 20252032
Report Studies
• The global Semiconductor EUV Photomask Inspection Equipment Market size was valued at US$ 1.15 billion in 2024 and is projected to reach US$ 2.28 billion by 2032, at a CAGR of 9.14% during the forecast period 2025-2032.
• Semiconductor EUV photomask inspection equipment plays a critical role in semiconductor manufacturing by detecting defects in extreme ultraviolet (EUV) lithography masks. These high-precision systems utilize advanced imaging technologies such as electron beam inspection and actinic inspection to identify pattern errors, particles, and other imperfections that could affect chip performance. The equipment is essential for maintaining yield rates in advanced node semiconductor production. Email: help@semiconductorinsight.com
• KLA Corporation (U.S.)
• ASML Holding NV (HMI division) (Netherlands)
• Lasertec Corporation (Japan)
• Carl Zeiss AG (Germany)
By Type:
• The market is segmented based on type into:
• Die to Die (DD) Method
• Die to Database (DB) Method
• Hybrid Inspection Systems
• Others
By Application:
• The market is segmented based on application into:
• IC Manufacturers
• Mask Shops
• Foundries
• Research Institutions
