Atomic Layer Etching System Market size was valued at US$ 743.8 million in 2024 and is projected to reach US$ 1.34 billion by 2032, at a CAGR of 8.7% during the forecast period 2025-2032
Report Studies
• The Global Atomic Layer Etching System Market size was valued at US$ 743.8 million in 2024 and is projected to reach US$ 1.34 billion by 2032, at a CAGR of 8.7% during the forecast period 2025-2032.
• Atomic Layer Etching (ALE) systems are precision semiconductor manufacturing tools that enable atomic-scale material removal through sequential self-limiting surface reactions. These systems utilize plasma-based or thermal processes to achieve ultra-precise etching capabilities for advanced semiconductor fabrication. The technology is critical for manufacturing next-generation logic and memory chips with 3D architectures at sub-7nm nodes.
By Type:
• The market is segmented based on type into:
• Plasma Type
• High Temperature Type
• Others
• The market is segmented based on application into:
• Transistor
• Extreme Ultraviolet Lithography
• Others
• Lam Research Corporation (U.S.)
• Applied Materials, Inc. (U.S.)
• Tokyo Electron Limited (Japan)
• Hitachi High-Tech Corporation (Japan)
• Oxford Instruments plc (UK)
